Abstract

Titanium dioxide (TiO2) thin films have gained much attention because of their applications in sciences and life. In recent years, many studies have focused to fabricate TiO2 films by various methods. At the first time, the high technology laboratory of the Natural Sciences University fabricated TiO2 thin film by rf sputtering. Optical characters of films were investigated by UV-VIS. The structures and roughness of surfaces were determined by X-ray diffraction (XRD) and Atomic force microscopy (AFM). The results were compared with these of thin films fabricated by dc sputtering. Furthermore, the change in structure by annealing was investigated by XRD and AFM.