Abstract

TiO2 film were deposited on glass by a DC "Sputter Managtron -Ion Plating" (SMIP). The influence of total pressure, oxygen mole fraction , discharge current on the structural properties were studied. By lowering the total pressure10-3torr) ; oxygen mole fraction (20%) and raising the diacharge current (0.6A0.7A), we found that the anatase - rutile phase can be obtained at low substrate temperature. Optical properties of these film were the refractive index n550 = 2.52.52;the extinction coefficent k ≈ 10-3cm-1 ; the absorption edge 0=350nm.