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Abstract
This paper demonstrates the possibility of developing a low-presure planar magnetron discharge. The space charge in this region as the negative state. Theoretical caculation show that, the discharge intensity Ia/p V_a^2 /B2 and discharge can be sustained at hight - vacuum . Such results have been experimetally verified. This magnetron was confirmed in this work to be a true low-temperature coating process quite suitable for plastics and other temperature sensitive substrates.
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Article Details
Issue: Vol 2 No 8 (1999)
Page No.: 37-44
Published: Aug 31, 1999
Section: Article
DOI: https://doi.org/10.32508/stdj.v2i8.3669
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Copyright: The Authors. This is an open access article distributed under the terms of the Creative Commons Attribution License CC-BY 4.0., which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.
How to Cite
Vinh Ai, D., Huu Chi, N., & Tran, L. (1999). A LOW-PRESURE PLANAR MAGNETRON WITH BALANCING THE MAGNETS AND APPLICATION OF THIS DEVICE TO THE METALLIZATION OF CDS. VNUHCM Journal of Science and Technology Development, 2(8), 37-44. https://doi.org/https://doi.org/10.32508/stdj.v2i8.3669
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