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A LOW-PRESURE PLANAR MAGNETRON WITH BALANCING THE MAGNETS AND APPLICATION OF THIS DEVICE TO THE METALLIZATION OF CDS.

Dao Vinh Ai 1
Nguyen Huu Chi 1
Le Tran 1
Volume & Issue: Vol. 2 No. 8 (1999) | Page No.: 37-44 | DOI: 10.32508/stdj.v2i8.3669
Published: 1999-08-31

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Copyright The Author(s) 2023. This article is published with open access by Vietnam National University, Ho Chi Minh city, Vietnam. This article is distributed under the terms of the Creative Commons Attribution License (CC-BY 4.0) which permits any use, distribution, and reproduction in any medium, provided the original author(s) and the source are credited. 

Abstract

This paper demonstrates the possibility of developing a low-presure planar magnetron discharge. The space charge in this region as the negative state. Theoretical caculation show that, the discharge intensity Ia/p  V_a^2 /B2 and discharge can be sustained at hight - vacuum . Such results have been experimetally verified. This magnetron was confirmed in this work to be a true low-temperature coating process quite suitable for plastics and other temperature sensitive substrates.

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