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Abstract
Transparent and conductive Al-doped ZnO (AZO) films were prepared by magnetron sputtering at temperature 200oC onto glass substrate. The films were treated with hydrogen plasma at temperatures 200oC from 30 to 60 minutes with 200 mW/cm2 power plasma. The optical, electrical and structural characteristics of the AZO coatings were analyzed as a function of the treatment time by spectrophotometry,Hall effects measurements, and X-ray diffraction. Results of X-ray diffraction analysis showed that the structure of the plasma-treated film did not change compared to that of the asdeposited film. The electrical resistivity of the AZO films decreased after H2 plasma treatment. The plasma treatment not only significantly decreased film resistivity but enhanced electrical stability as aging in air ambient. The average optical transmittance in the wave length range of 300 to 700 nm was 85%. These results were significant in application of AZO thin film as transparent electrode for a-Si:H based thin film solar cell prepared by PE-CVD method in next step.
Issue: Vol 16 No 4 (2013)
Page No.: 5-12
Published: Dec 31, 2013
Section: Natural Sciences - Research article
DOI: https://doi.org/10.32508/stdj.v16i4.1590
Copyright: The Authors. This is an open access article distributed under the terms of the Creative Commons Attribution License CC-BY 4.0., which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.
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