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Abstract

Vanadium pentoxide (V2O5) electrochromic thinfilms have been manufactured by magnetron DC sputtering method from Vanadium target (99.5% purity) in compound of O2 and Ar gases. In especially, films have crystalline structure at low depositing temperature (room temperature), which has been defined by XRD, Raman spectrum and SEM figure. The optical property of films has been investigated by transmittance – absorption spectroscopy. Moreover, electrochemic and electrochromic properties of films have been examined. As the result, films have high transmittance (>70%), low crystalline structure, high insertion lithium ability and stability with many electrochemic cycles. With these high properties, V2O5 sputtering thinfilms have capability to be used in application.

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Article Details

Issue: Vol 14 No 4 (2011)
Page No.: 67-76
Published: Dec 30, 2011
Section: Natural Sciences - Research article
DOI: https://doi.org/10.32508/stdj.v14i4.2028

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Copyright: The Authors. This is an open access article distributed under the terms of the Creative Commons Attribution License CC-BY 4.0., which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

 How to Cite
Le, H., Tran, T., Nguyen, H., & Tran, H. (2011). STRUCTURE AND ELECTROCHROMIC OF VANADIUM PENTOXIDE THINFILMS PREPARED BY MAGNETRON DC SPUTTERING AT ROOM TEMPERATURE. Science and Technology Development Journal, 14(4), 67-76. https://doi.org/https://doi.org/10.32508/stdj.v14i4.2028


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