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STRUCTURE AND ELECTROCHROMIC OF VANADIUM PENTOXIDE THINFILMS PREPARED BY MAGNETRON DC SPUTTERING AT ROOM TEMPERATURE

Hieu Van Le 1, *
Tuan Tran 1
Hao Duc Nguyen 1
Hien Quang Tran 2
  1. University of Science, VNU-HCM
  2. University of Tien Giang, Tien Giang
Correspondence to: Hieu Van Le, University of Science, VNU-HCM. Email: pvphuc@hcmuns.edu.vn.
Volume & Issue: Vol. 14 No. 4 (2011) | Page No.: 67-76 | DOI: 10.32508/stdj.v14i4.2028
Published: 2011-12-30

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Copyright The Author(s) 2023. This article is published with open access by Vietnam National University, Ho Chi Minh city, Vietnam. This article is distributed under the terms of the Creative Commons Attribution License (CC-BY 4.0) which permits any use, distribution, and reproduction in any medium, provided the original author(s) and the source are credited. 

Abstract

Vanadium pentoxide (V2O5) electrochromic thinfilms have been manufactured by magnetron DC sputtering method from Vanadium target (99.5% purity) in compound of O2 and Ar gases. In especially, films have crystalline structure at low depositing temperature (room temperature), which has been defined by XRD, Raman spectrum and SEM figure. The optical property of films has been investigated by transmittance – absorption spectroscopy. Moreover, electrochemic and electrochromic properties of films have been examined. As the result, films have high transmittance (>70%), low crystalline structure, high insertion lithium ability and stability with many electrochemic cycles. With these high properties, V2O5 sputtering thinfilms have capability to be used in application.

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