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Abstract
Titanium dioxide thin films that were deposited by unbalanced DC reactive magnetron sputtering on glass substrates have a high crystal structure and large surfac especially getting the anatase phase at the fairly low temperature substrates T, = 446K . The films were charaterized by X-ray diffraction, attomic force AFM, UV-vis spectroscopy. The photocatalytic properties of TiO2 thin films were tested with the degradation methylene blue MB under UV light irradiation. The best fabricated photocatalytic TiOthin films were found with such parameters: gas ratio 0 Ar = 0,06; sputtering power P, = 275W (1p = 0,5 A; Vp = 550V); target - substrate distance h = 4cm; pressure p = 13 mtorr, film thickness d = 660 nm and substrate temperature Tg = 485 K. These films also have a reused probability several times without decreasing amount of Methylene Blue (MB) degradation.
Issue: Vol 12 No 3 (2009)
Page No.: 16-23
Published: Feb 15, 2009
Section: Article
DOI: https://doi.org/10.32508/stdj.v12i3.2226
Copyright: The Authors. This is an open access article distributed under the terms of the Creative Commons Attribution License CC-BY 4.0., which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.
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