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HETEROEPITAXIAL GROWTH OF WO3 FILMS ON ITO(400) SURFACES AND THE EFFECT OF THICKNESS OF ITO LAYER, COATED ON GLASS SUBSTRATES ON GROWTH ORIENTATION OF WO3 LATTICE

Ngoc Van Le 1, *
Vinh Cao Tran 1
Tuan Tran 1
Dat Thanh Huynh 2
Phuong Ai Duong 1
Toai Quang Le 3
Hoa Van Bach 4
  1. University of Science, VNU-HCM
  2. VNU-HCM
  3. Voronezh State University, Russia
  4. Go Vap High School, Ho Chi Minh city
Correspondence to: Ngoc Van Le, University of Science, VNU-HCM. Email: pvphuc@hcmuns.edu.vn.
Volume & Issue: Vol. 12 No. 12 (2009) | Page No.: 14-21 | DOI: 10.32508/stdj.v12i12.2314
Published: 2009-06-28

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Copyright The Author(s) 2023. This article is published with open access by Vietnam National University, Ho Chi Minh city, Vietnam. This article is distributed under the terms of the Creative Commons Attribution License (CC-BY 4.0) which permits any use, distribution, and reproduction in any medium, provided the original author(s) and the source are credited. 

Abstract

WO3 films were deposited by rf magnetron sputtering method onto ITO(400)-coated glass substrates. Experiments showed that the growth orientation of WO3 crystalline lattice depends on the thickness of ITO layer. In this paper, this dependence will be discussed further.

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