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Abstract

We have investigated the photocatalytic TiO2 films deposited onto special glass substrates using unbalanced DC reactive magnetron sputtering technique. The goal of this study was to evaluate the efficiency of high sputtering currents without heat treatment in order to produce effectively photocatalytic-activity samples. Our films, even without substrate heating, are highly crystalline. XRD studies revealed a polycrystalline anatase phase appearing early at 185oC. Sample surfaces were scanned by a commercial model AFM. The optical properties were measured with the V-530 UV/VIS Spectrophotometer. The photocatalytic activities were affirmed through bleaching of Methylene Blue under UVA irradiation. As a result, high sputtering currents impressively prove the novel potential of TiO2 film catalyst.



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Article Details

Issue: Vol 11 No 10 (2008)
Page No.: 43-50
Published: Oct 31, 2008
Section: Natural Sciences - Research article
DOI: https://doi.org/10.32508/stdj.v11i10.2700

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Creative Commons License

Copyright: The Authors. This is an open access article distributed under the terms of the Creative Commons Attribution License CC-BY 4.0., which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

 How to Cite
Hanh Thu, V., Huu Chi, N., Van Hieu, L., Thanh Dat, H., Quynh Giao, N., & Kim Ngoc, P. (2008). DEPENDENCE OF SPUTTERING CURRENT AND HEAT TREATMENT ON PHOTOCATALYTIC ACTIVITIES OF TiO2 THIN FILMS DEPOSITED BY UNBALANCED DC REACTIVE MAGNETRON SPUTTERING. Science and Technology Development Journal, 11(10), 43-50. https://doi.org/https://doi.org/10.32508/stdj.v11i10.2700

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