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VNUHCM Journal of

Science and Technology Development

An official journal of Viet Nam National University Ho Chi Minh City, Viet Nam since 1997

ISSN: 1859-0128
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PREPARING TUNGSTEN OXIDE THIN FILM BY RF MAGNETRON SPUTTERING METHOD

Le Van Ngoc 1
Tran Tuan 1
Nguyen Van Den 1
Duong Ai Phuong 1
Huynh Thanh Dat 2
Tran Cao Vinh 2
Cao Thi My Dung 2

Volume & Issue: Vol. 8 No. 1 (2005) | Page No.: 29-33 | DOI: 10.32508/stdj.v8i1.2953
Published: 2005-01-31

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Copyright © 2005 by the author(s).

Copyright The Author(s) 2023. This article is published with open access by Vietnam National University, Ho Chi Minh city, Vietnam. This article is distributed under the terms of the Creative Commons Attribution License (CC-BY 4.0) which permits any use, distribution, and reproduction in any medium, provided the original author(s) and the source are credited. 

Abstract

WO3 thin films are prepared on glass substrates by rf magnetron sputtering method from WO3 ceramic target. Optical properties and crystalline Structure of films are investigated by transmittance spectra and X Ray diffraction spectra.

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