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CACULATING THE OPTIMAL THICKNESS FOR THE ANTIREFLECTION DIELECTRIC MULTILAYER THIN FILMS IN INFRARED REGION BY N-SQUARE SCAN METHOD

Le Vu Tuan Hung 1
Nguyen Van Den 1
Volume & Issue: Vol. 7 No. 4&5 (2004) | Page No.: 22-38 | DOI: 10.32508/stdj.v7i4&5.3193
Published: 2004-05-31

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This article is published with open access by Viet Nam National University, Ho Chi Minh City, Viet Nam. This article is distributed under the terms of the Creative Commons Attribution License (CC-BY 4.0) which permits any use, distribution, and reproduction in any medium, provided the original author(s) and the source are credited.

Abstract

The anti- reflection dielectric multi-layer thin films in infra-red region are interested by scientists because of their applications in technology and science as well as in daily life. Especially, nowadays The anti- reflection dielectric multi-layer thin films in infra-red region are also being studied to use for spaceflight optical equipment. In studying thin films, to design them is the first step and very important and necessary. So in our studying, we use matlab language to simulate the anti- reflection dielectric multi layer thin films in infra-red region with low reflection desire. The program also use to calculate the optimal thickness of layers thin film and chose the suitable materials for multilayer thin film. We use N-Square Scan method and matrix method to simulate mutilayer thin film. We can save a lot of time in studying thin film through this program.

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