THE TRANSPARENT DIELECTRIC THIN FILM WITH ADJUSTED REFRACTION INDEX FROM 1,4 TO 1,95
Published:
2004-07-31
Abstract
By Sol-gel method the TiOSi compound thin films is deposited on glass substrate from solution with two alkoxide components Tetraethylorthosilicate Si(OC2H3)4 and Tetra-n propylorthotitanate Ti(OC3H7)4. Some properties of thin films are determined by transmission spectrum, X ray diffraction, ATR and Raman spectroscopy. The datum are calculated by SCOUT software. Results show that with the TioSi thin films, there is a linear dependence of refractive index (from 1.43 to 1.95) on percentage concentration ratio of two alkoxides in the prepared process.