Abstract

In this work, we investigated effects of the annealing temperature on the crystalline, morphology of sputtered WO_x thin films. The resutls show that as-deposited WO_x thin films and annealed WO_xthin films at 300^oC, 600^oC in the air are in monoclinic phase. As the annealing temperature increases, crystallinity of WO_x thin films enhances with high(200) orientation. FESEM images showed larger grain size, and denser films at high annealing temperatures. The reversible resistance switching characteristics of the Ag/WO_x/FTO structure follows bipolar type, the switching ratio decreases as the crystallinity of WO_x thin films increases under an the annealing treatment.