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Abstract

Transparent conducting aluminium-doped Zinc oxide (ZnO:Al) have been deposited on glass substrates by magnetron dc sputtering using a powder target ( ZnO + 2%wt Al2O3) Electrical and optical properties of these films were investigated substrate temperature, sputtering pressure Ar and location of substrates in detail. Obtained the optimized results of film with resistivity of 3,7.10-4 Ω.cm, the average transmission in the visible range (300-800 nm) being greater than 85% and the reflection in the infrared range being greater than 85%. Above optimized conditions are (a) substrate set in perpendicularity to target, being 2,5 cm from the outside of erosion area, at substrate temperature of 160 degree Celsius, sputtering pressure of 10-3 torr.



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Issue: Vol 7 No 6 (2004)
Page No.: 11-15
Published: Jun 30, 2004
Section: Article
DOI: https://doi.org/10.32508/stdj.v7i6.3212

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Copyright: The Authors. This is an open access article distributed under the terms of the Creative Commons Attribution License CC-BY 4.0., which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

 How to Cite
Tran, L., Huu Chi, N., Tuan, T., & Van Binh, H. (2004). STUDYING AND MAKING TRANSPARENT CONDUCTING ZnO:Al THIN FILMS BY MAGNETRON DC SPUTTERING. Science and Technology Development Journal, 7(6), 11-15. https://doi.org/https://doi.org/10.32508/stdj.v7i6.3212

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