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THE INFLUENCE OF DOPING Ga ATOM ON CONDUCTIVE PROPERTIES OF ZnO THIN FILM MADE BY MAGNETRON SPUTTERING

Cao Thi My Dung 1
Tran Cao Vinh 1
Nguyen Huu Chi 1
Volume & Issue: Vol. 10 No. 3 (2007) | Page No.: 37-41 | DOI: 10.32508/stdj.v10i3.2761
Published: 2007-03-31

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Copyright The Author(s) 2023. This article is published with open access by Vietnam National University, Ho Chi Minh city, Vietnam. This article is distributed under the terms of the Creative Commons Attribution License (CC-BY 4.0) which permits any use, distribution, and reproduction in any medium, provided the original author(s) and the source are credited. 

Abstract

The transparent conductive thin films ZnO-Ga are rf magnetron sputtered from ZnO target doped 4.4% of Ga at a power of 200W. These films have resistivity as low as 4.6 x 10-4 cm and the optical transmittance of 85% (at 550nm). At room temperature, these films have good structure properties with very high orientation of (002) plane. The conductive properties were less affected by the bombardment of high energetic negative ions due to low surface ionization of the target. In addition, these films have high heat resistance in the atmospheric air due to high solubility of Ga in ZnO lattice.

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