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VNUHCM Journal of

Science and Technology Development

An official journal of Viet Nam National University Ho Chi Minh City, Viet Nam since 1997

ISSN: 1859-0128
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Fabrication of titanium nitride thin films by DC magnetron sputtering on different types of subtrates for coating applications

Thuong Tran Tuyet Vo 1, *
Tuan Anh Dao 2
Hang Thi Thu Cu 2
Hung Vu Tuan Le 2

  1. College of Electrical Engineering and Agriculture Southern
  2. University of Science, VNU-HCM
Correspondence to: Thuong Tran Tuyet Vo, College of Electrical Engineering and Agriculture Southern. Email: pvphuc@vnuhcm.edu.vn.
Volume & Issue: Vol. 17 No. 4 (2014) | Page No.: 65-73 | DOI: 10.32508/stdj.v17i4.1557
Published: 2014-12-31

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Copyright © 2014 by the author(s).

Copyright The Author(s) 2023. This article is published with open access by Vietnam National University, Ho Chi Minh city, Vietnam. This article is distributed under the terms of the Creative Commons Attribution License (CC-BY 4.0) which permits any use, distribution, and reproduction in any medium, provided the original author(s) and the source are credited. 

Abstract

Titanium nitride thin films (TiN) are fabricated by DC magnetron sputtering on different types of substrates such as glass substrates, PET substrates, substrate alloy (AISI 304) and drill steel. In this work we study the effect of distance target - substrate, sputtering time and negative voltage to the crystal structure, mechanical properties and optical films. The properties of thin films were studied by X-ray diffraction method Stylus, UV – Vis method and scanning electron microscopy. Results showed that the distance target - substrate, sputtering time and negative voltage affects the crystalline structure, mechanical properties and optical films. TiN films have been synthesized highly crystalline structure, crystal structure of thin films oriented along the the surface lattice (111), (200) and (311). Besides TiN thin films also have high reflectance in the visible and infrared range, good adhesion, high chemical durability.

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