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Abstract
The Ti-doped Zno films were deposited onto glass substrates from ceramic targets ZnO with various Ti concentrations using a DC magnetron sputtering. The experimental results show that all thin films are transparent and conductive oxide films, with the appropriate Ti concentration (⁓1.5% Ti), the conductance of films can be improved. Optical characteristics of thin films was determined by UV-V is spectroscopy. The thickness of thin films was measured by Stylus method. The electrical resistivity was measured by four-point probe, and the roughness of films was determined by AFM.
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Article Details
Issue: Vol 12 No 12 (2009)
Page No.: 59-64
Published: Jun 28, 2009
Section: Article
DOI: https://doi.org/10.32508/stdj.v12i12.2320
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Copyright: The Authors. This is an open access article distributed under the terms of the Creative Commons Attribution License CC-BY 4.0., which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.
How to Cite
Ho, B., Le, H., Nguyen, N., Huynh, D., Duong, P., & Le, H. (2009). STUDYING THE TRANSPARENT AND ELECTRICAL PROPERTIES OF ZnO:Ti THIN FILM WHICH IS PREPARED BY DC MAGNETRON SPUTTERINGSPUTTERING. Science and Technology Development Journal, 12(12), 59-64. https://doi.org/https://doi.org/10.32508/stdj.v12i12.2320
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