Natural Sciences - Research article Open Access Logo

Investigation of the crystal structure and the morphology of In and Ga-doped ZnO thin films applied for thermoelectric materials

Nhat Tran Hong Nguyen 1, *
Vinh Cao Tran 2
Thang Bach Phan 2
  1. University of Technology, VNU-HCM
  2. University of Science, VNU-HCM
Correspondence to: Nhat Tran Hong Nguyen, University of Technology, VNU-HCM. Email: pvphuc@vnuhcm.edu.vn.
Volume & Issue: Vol. 19 No. 2 (2016) | Page No.: 84-91 | DOI: 10.32508/stdj.v19i2.793
Published: 2016-06-30

Online metrics


Statistics from the website

  • Abstract Views: 0
  • Galley Views: 0

Statistics from Dimensions

Copyright The Author(s) 2023. This article is published with open access by Vietnam National University, Ho Chi Minh city, Vietnam. This article is distributed under the terms of the Creative Commons Attribution License (CC-BY 4.0) which permits any use, distribution, and reproduction in any medium, provided the original author(s) and the source are credited. 

Abstract

Undoped ZnO, Ga-doped ZnO, Ga and In dually doped-ZnO thin films were deposited by using magnetron Dc technique. Results from XRD, EDX and FESEM confirm influences of Ga and In dopants on the crystalline structure and the crystallinity of the ZnO thin films. Ga-doped ZnO thin films possess the highest crystallinity, while In and Ga dually doped-ZnO thin films were the worst. Through single and dual doping, the crystalline quality of the ZnO thin films can be controlled. Further researchs will be focused on the thermoelectric properties of the undoped ZnO and doped ZnO thin films.

Comments