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Studying about TiO2-xNx thin films fabricated by unbalanced DC reactive magnetron sputtring has showed that photocatalytic effects can be appeared under visible light. The characteristic films were tested by X-ray diffraction, UV-vis spectroscopy. Nitrogen concentration thin films were examinated by EDX methods. The photocatalytic properties of thin films were represented by Methylene Blue MB degradation (C16H18ClN3S.3H2O = 373,5). The results showed that the band gap increase when N2 conentration increase because of bonding with obital 2p in TiO2-xNx thin films.The studies also present a new mechanism on the Nitrogen doped in the anatase TiO2 to fabricate TiO2-xNx thin films, that is perfectly different from the doped mechanism before [1,8]. Moreover, the best thin films were fabricated with such parameters: sputtering pressure 13mtorr, power 240W, film thickness from 600nm to 700nm and gas ratio N2/O2 = 4 –5,5.

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Issue: Vol 11 No 6 (2008)
Page No.: 55-60
Published: Jun 30, 2008
Section: Natural Sciences - Research article

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Copyright: The Authors. This is an open access article distributed under the terms of the Creative Commons Attribution License CC-BY 4.0., which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

 How to Cite
Hanh Thu, V., Cong Truong, D., Huu Chi, N., Van Hieu, L., Thanh Dat, H., Kim Ngoc, P., & Minh Tri, L. (2008). NITROGEN DOPED TITANIUM DIOXIDE FILMS MECHANISM PREPARED BY REACTIVE DC MAGNETRON. Science and Technology Development Journal, 11(6), 55-60.

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