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Abstract

ITO thin films are deposited on glasses with ZnO buffer layers by magnetron sputtering. The crystalline orientation and quality of the ITO films depend muinly on the texture of ZnO buffers. ITO/ZnO/glass systems have a good crystal structure and well oriented along <111> direction, normal to substrate surface. The lowest resistivity of these films is 1.6 x 10-4 Ωcm deposited at substrate temparature of 350oC with the average transmittance of 85% (0.4 – 0.7 um) and reflectance of above 85% in the wavelength runge of more than 2 um.



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Article Details

Issue: Vol 8 No 4 (2005)
Page No.: 21-27
Published: Apr 30, 2005
Section: Article
DOI: https://doi.org/10.32508/stdj.v8i4.2981

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Copyright: The Authors. This is an open access article distributed under the terms of the Creative Commons Attribution License CC-BY 4.0., which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

 How to Cite
Cao Vinh, T., Huu Chi, N., My Dung, C., & Mong Cam, D. (2005). DEPOSITION OF ITO THIN FILM ON GLASS WITH ZnO BUFFER. Science and Technology Development Journal, 8(4), 21-27. https://doi.org/https://doi.org/10.32508/stdj.v8i4.2981

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