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Abstract
TiO2 thin film was fabricated by dc sputtering, SiO2 was made by rf sputtering with various ratio of O2 / Ar+O2 = 30%, 15%, 12% and 6%. The optical characteristics of films were determined by transmittance spectra UV-Vis. The structure and roughness surface Rms were investigated by AFM method. The ratio of O2 of 6% is the best condition to prepare for anti-reflection coating (AR) - double layers. It can increase about 4.5 % the transmittance if comparing with bare substrate.
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Article Details
Issue: Vol 9 No 9 (2006)
Page No.: 55-62
Published: Sep 30, 2006
Section: Article
DOI: https://doi.org/10.32508/stdj.v9i9.3101
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Copyright: The Authors. This is an open access article distributed under the terms of the Creative Commons Attribution License CC-BY 4.0., which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.
How to Cite
Tuan Hung, L., Van Den, N., & Thanh Dat, H. (2006). STUDYING OPTIMAL PARAMETERS OF TiO2 AND SiO2 THIN FILMS TO PREPARE FOR ANTI-REFLECTION COATING. Science and Technology Development Journal, 9(9), 55-62. https://doi.org/https://doi.org/10.32508/stdj.v9i9.3101
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